ETCHING CHAMBER FOR MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: An etching chamber for manufacturing a semiconductor is provided to prevent a wafer from being contaminated by particles in a subsequent etching process and to extend a lifetime of the chamber, by preventing the particles from being adhered to a wall of the chamber by a liner, and by preventing the particles from being adhered to the liner by using a heating coil. CONSTITUTION: A wafer settled in an electrostatic chuck(12) is etched in a plasma state. A liner(100) for preventing particles is installed between the electrostatic chuck and an inner wall of an etching chamber(10), composed of a quartz material. A heating coil is formed in the liner for preventing particles.