| 摘要 |
PURPOSE: A device and a method for transferring a substrate of a semiconductor and LCD(Liquid Crystal Display) manufacturing device are provided to reduce foot print and production costs, simplify construction of a system and shorten processing time of a wafer. CONSTITUTION: A front-end system(200) comprises a number of load ports(100,102,104) loading a wafer or a LCD glass substrate, an ATM(Asynchronous Transfer Mode) robot(202) transferring the loaded wafer or the substrate in a space not polluted at a waiting state and an ATM aligner(204) lining up a position of the transferred wafer or the LCD. The first and the second load lock chamber(300,302) respectively comprise the first and the second vacuum transfer arm(304,306) each located at a center of a main frame. The first and the second vacuum transfer arm(304,306) load the transferred wafer or the substrate on the first and the second end effect, directly transfer the loaded wafer or the substrate to the first and the second process chamber(504,506) and transfer the wafer or the substrate the process is ended to the first and the second end effect. The first and the second slot valve(400,402) separate the first and the second load lock chamber(300,302) from the first and the second process module(500,502). The first and second process module(500,502) respectively comprise the first and the second process chamber(504,506) to performs a process of the wafer or the substrate transferred by the first and the second load lock chamber(300,302).
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