发明名称 RECYCLABLE RETAINING RING ASSEMBLY FOR A CHEMICAL MECHANICAL POLISHING APPARATUS
摘要 <p>An annular ring assembly (34) is provided in which mechanical elements of the retaining ring assembly maintain strict planar flatness, rigidity, high tolerances and surface stability control. Additionally, glues, adhesives, and epoxies are eliminated from the construction of the plastic retaining and backing ring assembly (32). Further, adverse chemical reaction and contamination from adhesives that are typically in direct contact with chemical slurry and substrate layers undergoing polishing are eliminated. As a result, the present invention provides a low cost alternative to suppliers and manufacturers of retaining rings and facilitates a method to exchange, recondition and recycle the retaining ring for an infinite period, thus reducing consumable waste materials. Further, the ring assembly maintains uniform mechanical properties and strict tolerances after post reconditioning, thus reducing the variability and maintaining process consistency.</p>
申请公布号 WO2001023135(A2) 申请公布日期 2001.04.05
申请号 US2000026872 申请日期 2000.09.29
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