发明名称 UNIFORM GAS DISTRIBUTION IN LARGE AREA PLASMA TREATMENT DEVICE
摘要 <p>The apparatus generates a time-varying magnetic field through a field admission window (22) of plasma processing chamber (20) to create or sustain a plasma within the chamber by inductive coupling. It comprises: a magnetic core (38) presenting a pole face structure (38a), an inductor means (40) associated with the magnetic core, for generating a time-varying magnetic field throughout the pole face structure, means (42, 44, 48, 51) for injecting gas into said chamber and through said magnetic core.</p>
申请公布号 WO2001024220(A2) 申请公布日期 2001.04.05
申请号 EP2000009996 申请日期 2000.09.18
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