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发明名称
A METHOD OF PLANARIZING A SEMICONDUCTOR DEVICE USING A HIGH DENSITY PLASMA SYSTEM
摘要
申请公布号
EP1088339(A1)
申请公布日期
2001.04.04
申请号
EP19990912504
申请日期
1999.03.15
申请人
WJ SEMICONDUCTOR EQUIPMENT GROUP, INC.
发明人
ABRAHAM, THOMAS;BONDUR, JAMES, A.;GARCIA, JAMES, P.
分类号
H01L21/302;H01L21/3065;H01L21/3105;H01L21/3205;H01L21/768;(IPC1-7):H01L21/310
主分类号
H01L21/302
代理机构
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