| 摘要 |
PROBLEM TO BE SOLVED: To provide a plating method and a device therefor using an insoluble anode executing the supply only of metallic ions to be insufficient to a plating solution and preventing the accumulation of the other ions in the plating solution. SOLUTION: As to this method and device, separately from a plating tank 10, an electrolytic cell 11 in which plating metal is dissolved and the generation only of cations is executed, is provided, and, the supply of cations to be insufficient is executed from the electrolytic cell 11 to the plating tank 10.
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