发明名称 METHOD FOR EXHAUSTING THERMALLY ORGANIC COMPOUNDS OF WAFER
摘要 PURPOSE: A method for exhausting thermally organic compounds of a wafer is provided to exhaust organic compounds from a wafer by using an additional device for exhausting the organic compounds. CONSTITUTION: A lower plate(1) of a chamber is formed with a wafer support plate(2) and an O-ring(3). A thermal sensor(4) is adhered to one side of the lower plate(1) of the chamber. A clamp(5) is used for contacting closely an upper plate of the chamber with the lower plate(1) of the chamber. A wafer is loaded within a chamber. An absorbing trap is installed to a gas exhaust hole of the chamber. An inert carrier gas is provided to the gas injection hole of the chamber. Organic compounds are exhausted from the wafer by heating the chamber. The exhausted organic compounds are collected in the absorbing trap.
申请公布号 KR100293451(B1) 申请公布日期 2001.04.03
申请号 KR19980019834 申请日期 1998.05.29
申请人 HYUNDAI MICRO ELECTRONICS CO., LTD. 发明人 LEE, DO U
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利