发明名称 |
Method of and apparatus for washing photomask and washing solution for photomask |
摘要 |
Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H2 gas dissolved water. The photomask is dried. Thus provided is a method of washing a photomask in a manner which permits attaining an effect of removing foreign matter equivalent or superior to that of a conventional method with a small amount of chemical solution and reducing the amounts of chemicals and high purity water.
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申请公布号 |
US6209553(B1) |
申请公布日期 |
2001.04.03 |
申请号 |
US20000504728 |
申请日期 |
2000.02.16 |
申请人 |
MITSUBISHIDENKI KABUSHIKI KAISHA;ORGANO CORPORATION;M. WATANABE & CO., LTD. |
发明人 |
NAGAMURA YOSHIKAZU;YOSHIOKA NOBUYUKI;YAMANAKA KOJI;KUSUHARA MASAKI |
分类号 |
B08B3/02;B08B3/08;B08B3/12;G03F1/00;G03F1/08;G03F1/82;H01L21/027;(IPC1-7):B08B3/02 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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