发明名称 |
SEMI-INSULATING GaAs SINGLE CRYSTAL SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a semi-insulating GaAs single crystal substrate having both of high specific resistance and high activation rate. SOLUTION: The semi-insulating GaAs single crystal substrate contains carbon in an concentration of >=2×1015/ cm3, boron in an concentration of <=1×1016/cm3 and EL2 in an concentration of >=2×1016/ cm3.
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申请公布号 |
JP2001089300(A) |
申请公布日期 |
2001.04.03 |
申请号 |
JP19990273773 |
申请日期 |
1999.09.28 |
申请人 |
SHOWA DENKO KK |
发明人 |
IWASAKI AKITSUGU;ISHII KENJI |
分类号 |
C30B29/42;(IPC1-7):C30B29/42 |
主分类号 |
C30B29/42 |
代理机构 |
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代理人 |
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地址 |
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