发明名称 SEMI-INSULATING GaAs SINGLE CRYSTAL SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a semi-insulating GaAs single crystal substrate having both of high specific resistance and high activation rate. SOLUTION: The semi-insulating GaAs single crystal substrate contains carbon in an concentration of >=2×1015/ cm3, boron in an concentration of <=1×1016/cm3 and EL2 in an concentration of >=2×1016/ cm3.
申请公布号 JP2001089300(A) 申请公布日期 2001.04.03
申请号 JP19990273773 申请日期 1999.09.28
申请人 SHOWA DENKO KK 发明人 IWASAKI AKITSUGU;ISHII KENJI
分类号 C30B29/42;(IPC1-7):C30B29/42 主分类号 C30B29/42
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