发明名称 |
Method and evaporation chamber for generating a continuous vapor stream containing a compound having monovalent gallium therein, and a vacuum coating apparatus |
摘要 |
In a method and evaporation chamber for generating a continuous vapor stream containing a compound in which gallium is present in monovalent form of a vacuum coating method for vacuum coating a substrate, an evaporation substance containing gallium in bivalent or trivalent form, is arranged together with metallic gallium in the evaporation chamber, that is closed on all sides and has a vapor exit opening. The evaporation substance is evaporated, and the vapor is brought into contact with the metallic gallium, causing the bivalent or trivalent gallium to be reduced to monovalent gallium in a vapor stream which subsequently exits in the direction of the substrate via the vapor exit opening.
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申请公布号 |
US6210755(B1) |
申请公布日期 |
2001.04.03 |
申请号 |
US19990436987 |
申请日期 |
1999.11.09 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
FUCHS MANFRED;HELL ERICH;MATTERN DETLEF |
分类号 |
C23C14/06;C23C14/14;C23C14/24;(IPC1-7):C23C14/00;C23C16/00 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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