发明名称 |
Apparatus for feeding gases for use in semiconductor manufacturing |
摘要 |
An apparatus for feeding gases for use in semiconductor manufacturing reduced in size and manufacturing costs and facilitating maintenance and operation of the gas supply system. The apparatus comprises a plurality of gas supply sources, gas source valves provided on the gas lead-out pipes from the respective gas supply sources, flow rate controllers provided on main gas feed pipes into which the lead-out pipes converge, and gas supply valves provided on the outlet side of the flow rate controllers.
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申请公布号 |
US6210482(B1) |
申请公布日期 |
2001.04.03 |
申请号 |
US19990296136 |
申请日期 |
1999.04.22 |
申请人 |
FUJIKIN INCORPORATED;TOKYO ELECTRON LTD. |
发明人 |
KITAYAMA HIROFUMI;KURONO YOICHI;IKEDA NOBUKAZU;MASUDA NAOYA |
分类号 |
C23C16/44;C23C16/455;F17D1/04;H01L21/00;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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