发明名称 Apparatus for feeding gases for use in semiconductor manufacturing
摘要 An apparatus for feeding gases for use in semiconductor manufacturing reduced in size and manufacturing costs and facilitating maintenance and operation of the gas supply system. The apparatus comprises a plurality of gas supply sources, gas source valves provided on the gas lead-out pipes from the respective gas supply sources, flow rate controllers provided on main gas feed pipes into which the lead-out pipes converge, and gas supply valves provided on the outlet side of the flow rate controllers.
申请公布号 US6210482(B1) 申请公布日期 2001.04.03
申请号 US19990296136 申请日期 1999.04.22
申请人 FUJIKIN INCORPORATED;TOKYO ELECTRON LTD. 发明人 KITAYAMA HIROFUMI;KURONO YOICHI;IKEDA NOBUKAZU;MASUDA NAOYA
分类号 C23C16/44;C23C16/455;F17D1/04;H01L21/00;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23C16/00 主分类号 C23C16/44
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