发明名称 VAPOR-PHASE REACTOR
摘要 PURPOSE:To make an electric discharge uniform and to uniformly treat a substrate with plasma by making ruggednesses on at least one electrode between a couple of electrodes and specifying the distance between both electrodes. CONSTITUTION:A high-frequency power source 14 is connected to a couple of electrodes 11 and 12, and a substrate 13 is treated with plasma. The electrode 11 has ruggednesses, and the distance between the electrodes 11 and 12 is controlled to <=10mm. The aspect ratio of the ruggedness of the electrode 11 is gradually increased from the periphery to center of the electrode to further uniformize an electric discharge. Since the distance between the electrodes 11 and 12 is controlled to <=10mm, the generation of a strong discharge is suppressed at the peripheries of the electrodes 11 and 12, and a uniform discharge is realized.
申请公布号 JPH07316824(A) 申请公布日期 1995.12.05
申请号 JP19940126829 申请日期 1994.05.17
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 ITO KENJI
分类号 B01J19/08;C23C16/26;C23C16/30;C23C16/50;C23C16/505;H01J37/32;H01L21/205;H05H1/24 主分类号 B01J19/08
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