发明名称 METHOD AND DEVICE FOR CHEMICAL LIQUID PROCESS
摘要 PROBLEM TO BE SOLVED: To allow chemical liquid process with no falling of chemical liquid concentration during process by supplying a high-concentration liquid of a chemical liquid component whose boiling point is lower than a process liquid to a process bath through another line. SOLUTION: An aqueous ammonia is fed from an aqueous ammonia supply line to an aqueous ammonia condensing device 8 where an aqueous ammonia whose boiling point is lower than a process temperature is condensed to provide a high-concentration liquid. The high-concentration aqueous ammonia is supplied to an internal bath 1 through a piping 5A. With a supply line for a high- concentration aqueous ammonia provided as a separate line, an aqueous ammonia is condensed with the condensing device 8 before the high-concentration aqueous ammonia is supplied to the internal bath 1, so a chemical liquid process is performed efficiently with no aqueous ammonia concentration lowered. Even if the concentration of aqueous ammonia falls, it is quickly restored to a desired concentration. The condensation of aqueous ammonia is, for example, performed periodically for a specified period.
申请公布号 JP2001085382(A) 申请公布日期 2001.03.30
申请号 JP19990258455 申请日期 1999.09.13
申请人 SONY CORP 发明人 KARIYA RYUICHI
分类号 H01L21/306;G03F7/30;H01L21/027;H01L21/304;(IPC1-7):H01L21/306 主分类号 H01L21/306
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