发明名称 SILICON SUBSTRATE AND METHOD AND DEVICE FOR MEASURING LOW-TEMPERATURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a silicon substrate and a method and device for measuring low-temperature thereof where, when a specified process or test is performed with a silicon substrate at a low-temperature, an arbitrary part or region of the silicon substrate is used to easily measure the temperature of the silicon substrate. SOLUTION: A P-N junction 3 of a silicon substrate 1 has a constant temperature characteristics. A stable linear relationship exists between a temperature and forward voltage at 40-250 K and the P-N junction 3 can be used as a temperature sensor. So, P-N junction 3 is formed in the specified region of the silicon substrate 1, and the P-N junction 3 is applied with a forward current at 40-250 K for measuring the forward voltage.
申请公布号 JP2001083017(A) 申请公布日期 2001.03.30
申请号 JP19990261538 申请日期 1999.09.16
申请人 SUMITOMO HEAVY IND LTD 发明人 YAMADA TOSHIHARU
分类号 G01K7/01;(IPC1-7):G01K7/01 主分类号 G01K7/01
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