| 摘要 |
PROBLEM TO BE SOLVED: To enable an X-ray lithography reflection reduction projection system to be enhanced in numerical aperture by a method wherein a reflection reduction projection optical system is composed of a prescribed number of aspherical reflecting mirrors, and a reflecting mirror of specific shape, and a light flux from an object is focused into an image as an original image is reduced in size through single image formation. SOLUTION: A reflection reduction projection optical system is composed of at least five aspherical reflecting mirrors and a reflecting mirror of prescribed shape, and a light flux from an object O is focused into an image as an original image is reduced in size through single image formation. That is, the reflection reduction projection optical system is composed of a first convex mirror M1, a first concave mirror M2, a reflecting mirror M3 of prescribed shape, a second concave mirror M4, a second convex mirror M5, and a third concave mirror M6 which are arranged in this order from an object side, where an aperture stop S is provided on the second convex mirror M5. A multiplying power is 1/4, and a circular arc region where the height Y of an image is 30 to 31 is used as an exposure region. This reflection reduction projection optical system uses X-rays of wavelength 13 nm, a reticle is used as an object and a wafer is arranged on an image plane.
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