| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of aligning an optical element and a waveguide substrate so as to minimize the coupling loss between the optical element and the waveguide substrate without completely influenced by misalignment in a photolithographic process, and to provide a device to mount the optical element to be used for that method. SOLUTION: While the optical element 7 and the waveguide substrate 8 are irradiated with IR rays, the IR rays transmitting the optical element 7 and the waveguide substrate 8 are detected by an IR camera to obtain the luminance distribution. Then the luminance distribution is analyzed by an image processor 4 to measure a position of a specified part of the optical element 7 and the waveguide substrate 8. Then the optical element 7 and the waveguide substrate 8 are aligned based on measured data.
|
