摘要 |
PROBLEM TO BE SOLVED: To prevent deterioration of TAT by correcting the program pattern diameter to cancel mask bias effect such that the minimum unit in reticle design is one unit thereby minimizing complication of the process. SOLUTION: When an opening M-1 is not provided at an adjacent position, the size thereof is enlarged by one unit in the upper, right and left directions, respectively. When three or more openings are provided at adjacent positions, correction is not made. When an opening M-5 is provided only on the left side, the size thereof is enlarged by one unit in the upper and right directions, respectively. When an opening M-7 is provided only on the lower side, the size thereof is enlarged by one unit in the upper direction. In other words, an enlarging amount corresponding to the mask bias effect is set such that the minimum unit in reticle setting is one unit thus correcting the program diameter without altering reticle setting drastically. |