发明名称 PRODUCTION OF SEMICONDUCTOR DEVICE, METHOD FOR SETTING PROGRAM PATTERN DIAMETER AND MEDIUM RECORDING PROGRAM PATTERN DIAMETER SETTING PROGRAM
摘要 PROBLEM TO BE SOLVED: To prevent deterioration of TAT by correcting the program pattern diameter to cancel mask bias effect such that the minimum unit in reticle design is one unit thereby minimizing complication of the process. SOLUTION: When an opening M-1 is not provided at an adjacent position, the size thereof is enlarged by one unit in the upper, right and left directions, respectively. When three or more openings are provided at adjacent positions, correction is not made. When an opening M-5 is provided only on the left side, the size thereof is enlarged by one unit in the upper and right directions, respectively. When an opening M-7 is provided only on the lower side, the size thereof is enlarged by one unit in the upper direction. In other words, an enlarging amount corresponding to the mask bias effect is set such that the minimum unit in reticle setting is one unit thus correcting the program diameter without altering reticle setting drastically.
申请公布号 JP2001085538(A) 申请公布日期 2001.03.30
申请号 JP19990257076 申请日期 1999.09.10
申请人 NEC CORP 发明人 ICHINO TAKAKO;KUNITO MASAO
分类号 H01L21/027;G03F1/68;G03F1/70;H01L21/8246;H01L27/112 主分类号 H01L21/027
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