| 摘要 |
PROBLEM TO BE SOLVED: To obtain a substrate treatment apparatus, capable of effectively preventing evaporation of a treating liquid or external dispersion or the like of a treating liquid vapor by closing an opening part formed at a cover, even in a state in which the substrate is not treated. SOLUTION: This substrate treating apparatus comprises a treating tank 12 for storing a treating liquid therein, a substrate support member 11 for dipping a substrate W in the liquid via an opening part formed at an upper part of the tank 12, a pair of right and left first covers 13 formed with an opening for passing the member 11, and a second cover 14 arranged on the first cover 13 to close the opening of the cover 13.
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