发明名称 GAS LINE ATOMATIC PURGING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a gas line automatic purging system for efficiently executing opening/closing operation of valves which are inside and outside a processing chamber, where a vacuum chamber is installed and for preventing the misoperation of the opening/closing of the valves. SOLUTION: In a purging system, a vacuum chamber 2 installed in a semiconductor processing chamber 1, a piping system 7 introducing reaction gas or a purge gas to the vacuum chamber 2 from outside of the semiconductor processing chamber 1 and valves 4, 6, 8,9 and 10 are installed on the piping system 7 inside and outside of the semiconductor processing chamber 1 are installed. A valve control operation part 14 controlling the opening/closing of the valves 4, 6, 8, 9, 10 and 11 inside and outside the semiconductor processing chamber 1 at one location is installed in the semiconductor processing chamber.
申请公布号 JP2001085342(A) 申请公布日期 2001.03.30
申请号 JP19990263894 申请日期 1999.09.17
申请人 SONY CORP 发明人 NIIFUKU SATORU
分类号 H01L21/302;H01L21/02;H01L21/205;H01L21/3065;(IPC1-7):H01L21/205 主分类号 H01L21/302
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