DEVICE AND METHOD FOR PLASMA TREATMENT

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment device and a plasma treatment method by which uniform plasma treatment can be performed with high efficiency. SOLUTION: A plasma treating device performs plasma treatment on a substrate to be treated between an upper electrode and a lower electrode which are faced oppositely to each other under a short inter-electrode distance under a high discharge pressure condition, many nozzles 9 are radially arranged around the discharge space sandwiched between the upper and lower electrodes with their openings being directed toward the discharge space. The nozzles 9 are connected to a gas supplying device 11 through a first valve VA and a vacuum pump 13 for exhaust through a second valve VB and the flowing direction of gas in the discharge space is changed by switching the blowing-out directions of the gas from the nozzles 9, and the sucking direction of the gas as time elapses by controlling the opening/closing of the valves VA and VB. Therefore, a gas for generating plasma can be supplied uniformly, even under a short inter-electrode distance and high pressure plasma treatment condition.