发明名称 |
PROGRAMMED PRODUCTION OF MASK ROM |
摘要 |
PROBLEM TO BE SOLVED: To increase a pattern forming parameter area by obtaining a sufficiently flat program code through use of a specified principle. SOLUTION: A link group of decode B of the program code A of a mask A40 is obtained and then program code C is obtained. Furthermore, the program code A is linked with the inversion code B' of decode B to obtain program code D. Decode B is a program code where 0 and 1 are mixed. The program codes C and D are divided, respectively, into masks C60 and D70 which are then exposed twice independently thus obtaining results similar to those obtained by using the mask A40 independently. Since the program code A is linked into groups, two sets of sufficiently uniform program code are obtained and the pattern forming parameter area can be increased. |
申请公布号 |
JP2001085537(A) |
申请公布日期 |
2001.03.30 |
申请号 |
JP19990254657 |
申请日期 |
1999.09.08 |
申请人 |
MACRONIX INTERNATL CO LTD |
发明人 |
O HEIEI;CHO ZUIKIN;YO SHUNGI;RIN SHUNEI;O MEISO |
分类号 |
H01L21/027;G03F1/00;G03F1/68;G11C17/08;H01L21/8246;H01L27/112 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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