MICROWAVE PLASMA PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To uniformly process a wide area of a subject to be processed with a plasma. SOLUTION: A microwave produced by a microwave power supply 1 is introduced into a microwave radiator 6 through an impedance matching device 4 and a matching transformer 5 and radiated into a plasma processing chamber 7 via a vacuum-sealed quartz window 11. A ferrite core 16 is disposed in the microwave radiator 6 and a magnetic field generating means 17 is provided for applying a DC magnetic field externally to the ferrite core. Thus, field strength at each end of the microwave radiator 6 is controlled to improve the distribution of microwave field strengths over a large width.