发明名称 ULTRAVIOLET RAY IRRADIATION DEVICE AND METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an ultraviolet ray irradiation device and a method thereof capable of highly efficiently cleaning or reforming a large sized material to be worked with the small number of dielectric excimer lamp. SOLUTION: The ultraviolet irradiation device is provided with an ultraviolet irradiation light source 11, a moving means 14 for linearly and relatively moving the material W to be worked to the ultraviolet ray irradiation light source in the width direction to cross the irradiation range of the ultraviolet ray and a control means 15 for controlling the moving means to be equal to or below aP/J ((a) represents the width of the ultraviolet irradiation light source, P represents an average quantity of light and J represents an accumulated quantity of light per the unit area required for cleaning and reforming of the material W to be worked) in the relative moving speed of the material W to be worked in the irradiation range of the ultraviolet ray and to relatively move the material W to be worked in one direction to the ultraviolet ray irradiation light source.
申请公布号 JP2001079387(A) 申请公布日期 2001.03.27
申请号 JP19990263314 申请日期 1999.09.17
申请人 HOYA SCHOTT KK 发明人 AMANO SATORU
分类号 B08B7/00;B01J19/08;C03C23/00;(IPC1-7):B01J19/08 主分类号 B08B7/00
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