发明名称 ALUMINUM OXIDE-DEPOSITED FILM AND ITS PREPARATION
摘要 PROBLEM TO BE SOLVED: To prepare an aluminum oxide-deposited film which has a high transparency, an excellent oxygen gas-barrier property, water vapor-barrier property, or the like, and especially, allows little change in its water vapor-barrier property when the ambient temperature changes, and to provide a preparation process thereof. SOLUTION: A deposited film is prepared by allowing aluminum vapor to react with oxygen in a gaseous phase to form an aluminum oxide-deposited membrane 21 on the surface of a substrate film 4. Here, the deposited membrane is formed while adjusting in-line the total light transmission of the deposited film at 500 mm so that a slightly colored state of from 90 to 98% against the substrate film 4 is yielded. The deposited film is rolled up with the deposited membrane facing inside, subsequently rewound with the deposited membrane facing outside, left for more than 48 hr under an atmosphere wherein the temperature is from 35 to 45 deg.C and the relative humidity is from 80 to 100% RH to modify the total light transmission of the deposited film at 500 nm into 99% or larger.
申请公布号 JP2001081219(A) 申请公布日期 2001.03.27
申请号 JP19990255312 申请日期 1999.09.09
申请人 DAINIPPON PRINTING CO LTD 发明人 SAKAMOTO HISASHI
分类号 B65D81/34;B32B7/02;B32B9/00;B65D65/40;C08J7/06;C23C14/08;(IPC1-7):C08J7/06 主分类号 B65D81/34
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