发明名称 COLD-SETTING AQUEOUS HALOGEN-CONTAINING COATING MATERIAL COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a cold-setting aqueous halogen-containing coating material composition capable of forming coating film having excellent low-temperature film forming properties, coating appearance, strength of coating film, resistances to stain, boiling water, solvent, weather and heat and adhesion to a substrate. SOLUTION: This cold-setting aqueous halogen-containing resin composition comprises a halogen-containing resin, a crosslinking agent of the formula: HS (CF2)nSH (n is an integer of 2-20) or the formula (R is selected from the group consisting of CF3, C2F5 and C3F7) and an aliphatic primary diamine compound as a crosslinking catalyst. A chlorotrifluoroethylene/vinylidene fluoride/ cyclohexyl vinyl ether copolymer is preferably used as the halogen-containing resin.
申请公布号 JP2001081391(A) 申请公布日期 2001.03.27
申请号 JP19990298697 申请日期 1999.09.13
申请人 UDAGAWA REIKO 发明人 UDAGAWA REIKO
分类号 C08J3/24;C09D7/12;C09D127/02;(IPC1-7):C09D127/02 主分类号 C08J3/24
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