发明名称 |
PRODUCTION OF POLYSILOXANE RESIN FOR USE IN NEARULTRAVIOLET REGION |
摘要 |
PROBLEM TO BE SOLVED: To provide a polysiloxane resin having low absorption of light in near-ultraviolet region. SOLUTION: The process for the production of a polysiloxane resin for the use in near-ultraviolet region comprises the reaction and curing of a polysiloxane having SiH group in the molecule with a polysiloxane having vinyl group directly bonded to Si atom in the molecule in the presence of a platinum catalyst. The resin can be cured by setting the amount of the SiH group of the polysiloxane having SiH group to >=1.2 times equivalent based on the vinyl group of the polysiloxane having vinyl group directly bonded to Si atom.
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申请公布号 |
JP2001081194(A) |
申请公布日期 |
2001.03.27 |
申请号 |
JP19990255991 |
申请日期 |
1999.09.09 |
申请人 |
DOW CORNING ASIA LTD |
发明人 |
EGUCHI KATSUYA;KUSHIBIKI NOBUO |
分类号 |
C08G77/50;C08G77/06;(IPC1-7):C08G77/50 |
主分类号 |
C08G77/50 |
代理机构 |
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