| 摘要 |
PROBLEM TO BE SOLVED: To reduce load at developing of exposure control data, in an electron beam exposure system. SOLUTION: Plural dot control data D(D(i, j, k), D(i+1, j, k), D(i, j+1, k), D(i+1, j+1, k)) for individually control of the irradiation of plural electron beams are connected and compressed, and compressed connection control data are generated. Then, the plural compressed connection control data are arranged, and exposure control data can be generated. In this electron beam exposure system, the exposure control data are developed to have the plural dot control data reproduced, and exposure can be executed by controlling a blanker, based on the reproduced dot control data.
|
