发明名称 PLASMA PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To avoid a high-frequency interference which occurs between adjacent high-frequency electrodes so as to prevent a hunting phenomenon by a method wherein partitioning members which demarcate plasma generating spaces respectively are provided inside a vacuum chamber. SOLUTION: A partitioning member 6 of meshes or punching metal is provided between adjacent high-frequency electrodes 2 and at an outward edge of electrodes 2 located at the ends of a row of electrodes 2. The partitioning members 6 demarcates a plasma generating space between the high-frequency electrode 2 and an anode electrode 3. The partitioning members 6 are connected to a ground potential so as to reduce a potential induced by high-frequency plasma to an irreducible minimum. By this setup, the partitioning members are permeable to gas but substantially restrain plasma, which is generated in the plasma generating spaces demarcated by them combined with the high-frequency electrodes 2, from leaking out, and a high-frequency interference between the adjacent high-frequency electrodes 2 can be avoided, so that a hunting phenomenon can be prevented from occurring.
申请公布号 JP2001077091(A) 申请公布日期 2001.03.23
申请号 JP19990249904 申请日期 1999.09.03
申请人 ULVAC JAPAN LTD 发明人 TAKEI HIDEO;ISHIKAWA MICHIO;OTA YOSHIFUMI;KIKUCHI MASASHI;IKEDA HITOSHI;OSONO MASA
分类号 H01L21/302;C23C16/505;C23F4/00;H01L21/205;H01L21/3065;H05H1/46 主分类号 H01L21/302
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