| 摘要 |
PROBLEM TO BE SOLVED: To accelerate the exposure processing of exposure control data, in an electron beam exposure system. SOLUTION: This exposure system is provided with plural developing parts 411-1 to 411-8 and RAMs 412-1 to 412-8, and plural unit dot control data, constituting exposure control data are developed in parallel. A cross bar 420 selects the exposed unit dot control data in a prescribed order and writes the data in an FIFO memory 430. The unit dot control data written in the FIFO memory 430 are supplied via a Tmp register 440 to a shift register 450, and converted into serial data, and supplied via a driver 460 to a blanker 32.
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