| 发明名称 |
Plasma assisted gas processing with titania |
| 摘要 |
<p>A plasma assisted reactor for the processing of a gaseous medium, including a bed of active material including or titania and zirconia, the majority of the titania comprising textured rutile or anatase phase or a mixture of textured rutile and anatase phases.</p> |
| 申请公布号 |
GB2335869(A) |
申请公布日期 |
1999.10.06 |
| 申请号 |
GB19990014428 |
申请日期 |
1998.12.10 |
| 申请人 |
* AEA TECHNOLOGY PLC |
发明人 |
STEPHEN IVOR * HALL;ANTHONY ROBERT * MARTIN;DAVID LESLIE * SEGAL;JAMES TIMOTHY * SHAWCROSS |
| 分类号 |
B01D53/56;B01D53/32;B01D53/74;B01D53/94;B01J19/08;F01N3/08;F01N3/20;F01N13/02;F02B1/04;H05H1/24;(IPC1-7):B01D53/32 |
主分类号 |
B01D53/56 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
