发明名称 LAMINATE FILM FILM-FORMING DEVICE, MANUFACTURE OF MAGNETORESISTANCE SENSOR USING THE SAME, AND THE MAGNETORESISTANCE SENSOR
摘要 PROBLEM TO BE SOLVED: To form a giant magnetoresistance effect magnetoresistance sensor film having satisfactory characteristics or a spin tunnel magnetoresistive sensor film by a method, where when a film formation is performed using at least one material in one film-forming process on a substrate, a laminated film film- forming device has a means changeable a potential in the substrate during the film formation. SOLUTION: A film-forming chamber 13 adjusts the output of a DC power supply 134 by a cathode controller 138 through a film-forming chamber control system 139 and controls the quantity of a material, an atomic cluster, which released from a target 132 through sputtering. In a film-forming chamber 14, a coil 140 is installed in the vicinity of a target 142 and power from an AC power supply 146 is fed to the coil 140 via a matching device 145, but by changing the output of the power supply 146 during film formation by an AC power programmable controller 147, potential in a plasma is changed during the time, when the film-formation is performed, whereby a potential in a substrate can be controlled.
申请公布号 JP2001077443(A) 申请公布日期 2001.03.23
申请号 JP19990252594 申请日期 1999.09.07
申请人 HITACHI LTD 发明人 WATANABE KATSURO;MEGURO KENICHI;HAMAKAWA YOSHIHIRO
分类号 G11B5/39;C23C14/54;H01F10/32;H01F41/18;H01F41/30;H01L43/12;(IPC1-7):H01L43/12 主分类号 G11B5/39
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