发明名称 SAMPLE STAGE FOR SCANNING ELECTRON MICROSCOPE
摘要 <p>PROBLEM TO BE SOLVED: To attain deformation quantity larger than shift quantity for a sample by providing a mechanism for vertically moving and pulling the sample. SOLUTION: Since a sample bed 1 fixing the sample 2 is fixed to a pulling base 4, the sample 2 is moved downward, when the pulling base 4 is moved downward. When the position of the sample 2 becomes lower than the tip of a fixed bed 3 installed on a stage base 12, the sample 2 is pressed to the fixed bed 3, the moving direction of the sample 2 is changed at both ends of the fixed bed 3, and the sample 2 is pulled in the horizontal direction. Since the pulling amount of the sample 2 becomes about two times the actual shift distance of the sample bed 1, it can cope with the sample 2 requiring a large pulling amount. The pulling direction of the sample 2 is preferably changed by changing the shapes of the sample bed 1 fixing the sample 2 and the fixed bed 3 pressing the sample 2, and a heater is provided on this sample stage to concurrently heat the sample 2.</p>
申请公布号 JP2001076662(A) 申请公布日期 2001.03.23
申请号 JP19990246926 申请日期 1999.09.01
申请人 HITACHI LTD;HITACHI SCI SYST LTD 发明人 KANEKO NOBORU;KUROME YUZO;TANAKA RYUICHI
分类号 H01J37/20;G01N23/225;(IPC1-7):H01J37/20 主分类号 H01J37/20
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