发明名称 MAGNETIC SPUTTERING TARGET AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To reduce deformation on an erosion shape by setting a maximum value and a minimum value within a specific range of an intermediate value regarding a magnetic characteristic of any one of a maximum permeability, a coercivity, and a squareness ratio on an initial magnetization curve, in a sputtering plane of a target. SOLUTION: In a magnetic target for magnetron sputtering, in a sputtering plate of a target, a maximum value and a minimum value of any one of a maximum permeability, a coercivity, and a squareness ratio on an initial magnetization curve are set within±15% of an intermediate value. When the value is beyond the range, deformation appears on an erosion shape. Further, upon manufacturing ingot target, a predetermined magnetic material is dissolved and casted into an ingot, and undergoes hot casting or rolling. Furthermore, the material undergoes cold working and is formed into a plate, a target shape, and so on. Additionally, with hot and cold cross rolling, upsetting casting and the like, it is possible to achieve a target which is small in magnetic anisotropy in the sputtering plane and has isotropic deformation.
申请公布号 JP2001076955(A) 申请公布日期 2001.03.23
申请号 JP19990253753 申请日期 1999.09.08
申请人 NIKKO MATERIALS CO LTD 发明人 IWANABE YOJI
分类号 G11B5/851;B21B1/42;C23C14/34;H01F41/18;(IPC1-7):H01F41/18 主分类号 G11B5/851
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