| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type electron beam or X-ray resist composition having high resolution, enabling to give a pattern profile excellent in rectangularity, improving a development defect and decreasing PEB temp. dependency by making the composition contain a specific onium salt generating an acid by the irradiation with an electron beam or an X-ray and a resin increased in the solubility to an alkali developer by the action of the acid. SOLUTION: This positive type electron beam or X-ray resist composition contains an onium salt generating an acid by the irradiation with electron beam or X-ray and having one electron attractive group on a substituted group in a cation part and the resin increased in the solubility to the alkali developer by the action of the acid (b). The onium salt is one kind of a compound selected from a group composed of compounds expressed by a formula or the like. In the formula, one of R1-R15 represents an electron attractive group and the remaining groups can be as the same as or different from each other and each represents hydrogen atom, an alkoxy group, which can be branched or the like. X represents one of a (substituted) 1-12C alkane sulfonic acid, benzene sulfonic acid or the like. |
