| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent contamination generated from a substrate itself and an internal structural member by a method wherein a circulating flow is formed in a holding container from a flow passage of flowing towards a substrate and a flow passage of flowing towards a blower, and this is purified with a particle elimination filter and a gaseous impurity capture filter to flow it towards a substrate holding part. SOLUTION: The interior of a container body is sectioned into a central chamber 13a and a pair of individual chambers 13b positioned on both sides by a partition plate 4, an air flown into the central chamber 13a is branched to two parts by a guide plate 14, and a circulating passage of the air which passes the individual chamber 13b and returns to a fan motor 7 is formed. Here, the air passes a gaseous impurity capture film 6 and an ULPA 5 to be purified, is led into a gap of a wafer by an entrance rectification plate, flows along an inner surface of the rectification plate 14 and a wafer carrying in/out door 2, and inverses to pass the individual chamber 13b and return to the fan motor 7. In this process, a solid mater or a gaseous matter such as particles, etc., adhering to each part is carried to the circulating air flow, which flows to the wafer after purified.</p> |
