摘要 |
A halftone phase shift photomask having its transmittance, at wavelengths used on an inspection/measuring device, accurately controlled so as to easily ensure a photomask quality even when it is accurately controlled at a phase difference of 180 DEG and exposure wavelengths with a transmittance set to a desirable one of 1 to 20%, the halftone phase shift photomask (107) comprising a halftone phase shift film formed on a transparent substrate (101) and containing at least tantalum, oxygen, carbon and nitrogen, wherein the photomask has a structure in which different films are laminated in at least two layers (102, 103). |
申请人 |
DAI NIPPON PRINTING CO., LTD.;FUJIKAWA, JUNJI;KINASE, YOSHINORI;OKAMURA, TAKASHI;MOHRI, HIROSHI;YOKOYAMA, TOSHIFUMI;KOKUBO, HARUO |
发明人 |
FUJIKAWA, JUNJI;KINASE, YOSHINORI;OKAMURA, TAKASHI;MOHRI, HIROSHI;YOKOYAMA, TOSHIFUMI;KOKUBO, HARUO |