发明名称 METHOD FOR MEASURING EVENNESS OF NONWAVEN FABRIC
摘要 PURPOSE: A method is provided to evaluate evenness of novena fabric rapidly to control production processes with a feedback of the evaluation result by calculating an average value, a histogram, and a variation coefficient. CONSTITUTION: An image input is carried out by a CCD camera(14). The light from the CCD camera(14) is irradiated on novena fabric and an amount of light reflected from a surface of the novena fabric is divided into pixels for measurement. Pre-processing is performed by leveling a histogram and removing an image noise. An image analysis is carried out wherein an average value, a histogram, and a variation coefficient are calculated from restructured image data. The leveling of the histogram is carried out by leveling the brightness distribution in 4 to 256 steps.
申请公布号 KR20000025034(A) 申请公布日期 2000.05.06
申请号 KR19980041911 申请日期 1998.10.02
申请人 CHEIL PRODUCTS CO., LTD.;JEONG, SUNG HUN 发明人 JEONG, SUNG HUN
分类号 G01B11/30;(IPC1-7):G01B11/30 主分类号 G01B11/30
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