发明名称 |
METHOD FOR MEASURING EVENNESS OF NONWAVEN FABRIC |
摘要 |
PURPOSE: A method is provided to evaluate evenness of novena fabric rapidly to control production processes with a feedback of the evaluation result by calculating an average value, a histogram, and a variation coefficient. CONSTITUTION: An image input is carried out by a CCD camera(14). The light from the CCD camera(14) is irradiated on novena fabric and an amount of light reflected from a surface of the novena fabric is divided into pixels for measurement. Pre-processing is performed by leveling a histogram and removing an image noise. An image analysis is carried out wherein an average value, a histogram, and a variation coefficient are calculated from restructured image data. The leveling of the histogram is carried out by leveling the brightness distribution in 4 to 256 steps.
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申请公布号 |
KR20000025034(A) |
申请公布日期 |
2000.05.06 |
申请号 |
KR19980041911 |
申请日期 |
1998.10.02 |
申请人 |
CHEIL PRODUCTS CO., LTD.;JEONG, SUNG HUN |
发明人 |
JEONG, SUNG HUN |
分类号 |
G01B11/30;(IPC1-7):G01B11/30 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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