| 摘要 |
A cleaning device for film deposition device comprises a process container (4) to accommodate a holder (10) for holding a workpiece (W), means (52) for introducing a predetermined gas into the process container, a vacuum system (36) for evacuating the process container, and an automatic pressure control valve (42) coupled to the vacuum system to maintain a constant pressure in the process container by adjusting the value opening. To facilitate accurate detection of the end of cleaning, the cleaning device further comprises means (62) for supplying cleaning gas to the means for introduction, means (64) for monitoring the valve opening of the automatic pressure control valve, means (66) for detecting the change in the valve opening based on the output from the valve monitor means, and means (68) for detecting the end point of cleaning based on the output from the detection means.
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