发明名称 |
EPITAXIAL WAFER AND LED MANUFACTURED USING THE WAFER |
摘要 |
PROBLEM TO BE SOLVED: To increase the light output of a LED by allowing the carrier density of a graded composition layer in an epitaxial layer to have such a carrier density profile that may have the maximum value at a place within the graded composition layer a specified distance away from the termination point within the graded composition layer. SOLUTION: This epitaxial wafer has an n-type GaAsP epitaxial layer 16 on an n-type single crystalline substrate 20. The epitaxial layer 16 at least comprises a graded composition layer 21 and fixed composition layers 22 and 23. The carrier density of the graded composition layer 21 has such a carrier density profile that may have the maximum value at a place within the graded composition layer (including the termination point) 2 μm or more away from the termination point within the graded composition layer. The start point and the termination point of an epitaxial layer such as the graded composition layer mean a start point and a finish point of growth of the layer respectively. For example, the maximum value of the n-type carrier density is 2-30×1017 cm-3. |
申请公布号 |
JP2000183396(A) |
申请公布日期 |
2000.06.30 |
申请号 |
JP19980356553 |
申请日期 |
1998.12.15 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
SATO TADASHIGE |
分类号 |
C30B25/18;C30B29/40;H01L21/205;H01L33/30 |
主分类号 |
C30B25/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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