发明名称 |
Optical member of silica glass for transmitting fluorine excimer laser radiation and method for producing the same |
摘要 |
A method for producing an optical silica glass member for transmitting F2 excimer laser radiation is known which comprises an optical silica glass for transmitting F2 excimer laser radiation formed of a transparent glass body prepared by depositing fine silica particles obtained by flame hydrolysis in gaseous phase of a compound containing silicon on a heat resistant base body and thereby forming a porous preform, followed by vitrifying the resulting porous preform into a transparent body in the temperature range of from 1,400 to 1,500 DEG C. In oder to improve the resistance against a F2 excimer laser radiation, it is suggested that the process further comprises between the production step of the porous preform and the vitrification step for obtaining the transparent glass body: a first step of performing heat treatment in a temperature range of from 800 to 1,200 DEG C under a mixed gaseous atmosphere of a chlorine-containing compound and oxygen; and a second step of performing heat treatment for doping fluorine after the first step above, in a temperature range of from 800 to 1,300 DEG C under a gaseous atmosphere of a compound containing fluorine atoms. <IMAGE> |
申请公布号 |
EP1084995(A1) |
申请公布日期 |
2001.03.21 |
申请号 |
EP20000120087 |
申请日期 |
2000.09.15 |
申请人 |
HERAEUS QUARZGLAS GMBH & CO. KG;SHIN-ETSU QUARTZ PRODUCTS CO., LTD. |
发明人 |
YAGINUMA, YASUYUKI;FUJINOKI, AKIRA;NISHIMURA, HIROYUKI;YOKOTA, TORU |
分类号 |
H01L21/027;C03B8/04;C03B19/14;C03B20/00;C03C3/06;C03C4/00;G02B1/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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