发明名称 BASE MATERIAL PROVIDED WITH HIGHLY DURABLE PHOTOCATALYST FILM AND PRODUCTION PROCESS OF THE SAME
摘要 PROBLEM TO BE SOLVED: To produce a base material provided with a highly durable photocatalyst film which concurrently has photocatalytic activity, wear resistance and a chemical resistance by setting the ratios (wt.%) of the contents of the constituents, i.e., ZrO2, SiO2 and crystalline TiO2 in the photo catalyst film to values within specified ranges, respectively. SOLUTION: This base material is provided with a photocatalyst film formed by coating the surface of the base material with a coating liquid that is obtained by dispersing TiO2 crystals into a coating film forming component comprising ZrO2 and SiO2, wherein, in the photocatalyst film, the content ratio of the constituent ZrO2 used in the form of zirconium chloride, zirconium oxychloride, a chlorine-containing zirconium alkoxide, or the like, is set to 25-60 wt.%; the content ratio of the constituent SiO2 used in the form of an alkoxysilane such as tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane or methyltriethyoxysilane, is set to 15-50 wt.%; and the content ratio of the constituent TiO2 crystals is set to 25-45 wt.%. Thus, the objective base material provided with a highly durable photocatalyst film which concurrently has photocatalytic activity with respect to antifouling properties, hydrophilicity, or the like, wear resistance and chemical resistance, can be produced.
申请公布号 JP2001070801(A) 申请公布日期 2001.03.21
申请号 JP19990248155 申请日期 1999.09.02
申请人 CENTRAL GLASS CO LTD 发明人 YAMAMOTO HIDEKI;YAMAZAKI SEIJI;NISHIDA YOSHIHIRO;HONJO KEIJI
分类号 B05D5/00;B01J21/08;B01J35/02;B05D7/24;C09D1/00;C09D5/00;C09D5/16;(IPC1-7):B01J35/02 主分类号 B05D5/00
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