| 摘要 |
PROBLEM TO BE SOLVED: To more precisely control a microwave radiation characteristic and to enhance the uniformity of a plasma treatment in a radial direction of a work by arranging the centers of plural slots for radiating microwaves so as to deviate from the center of an annular waveguide. SOLUTION: The annular waveguide 13 forms an endless annular groove having, for example, a circumferential length of 3 times the wavelength in the waveguide, i.e., 152 mm and a slotted plate 23 is so formed that the center of the slot 33 deviates 24 mm inward from the center of the annular waveguide 13. The work W is installed on a work holding means 2 and is heated and held to and at 300 deg.C after the pressure is reduced to, for example, 1.33×10-5 Pa. Gaseous nitrogen and gaseous monosilane are introduced into a vessel 1 and the inside of the vessel is maintained under 2.66 Pa by a discharge system valve. Electric power of, for example, 3.0 KW and 2.45 GHz is supplied via a microwave supply device 3 from a microwave power source 6 to generate the plasma within a space 9, by which the silicon nitride film is obtained. |
