发明名称 ETCHING OF QUARTZ VIBRATING FRAGMENT, ETCHING DEVICE AND STORING CONTAINER OF QUARTZ FRAGMENT FOR ETCHING
摘要 PROBLEM TO BE SOLVED: To provide a method and apparatus for etching a quartz vibration fragment by which the floating of the quartz fragment during the etching can be prevented without contaminating the environment, and the wholly homogeneous and highly accurate etching treatment can be carried out. SOLUTION: This method for carrying out the etching treatment of a quartz fragment 1 with an etching liquid 12 at least containing hydrofluoric acid comprises inserting the quartz fragment 1 into an etching vessel 11 storing the etching liquid 12 and immersing the quartz fragment 1 in the etching liquid 12 by a means 15 for compulsively immersing the quartz fragment 1 into the etching liquid. The quartz fragments 1 are preferably inserted into the etching liquid 12 according to the inserting order determined so as to correspond to the finishing ranks in a step for producing the quartz fragments 1.
申请公布号 JP2001072497(A) 申请公布日期 2001.03.21
申请号 JP20000000929 申请日期 2000.01.06
申请人 SEIKO EPSON CORP 发明人 SHIRAISHI SHIGERU;FUNATSU MORIMASA
分类号 B65D85/38;C30B29/18;C30B33/10;H01L21/306;H01L41/09;H03H3/02;(IPC1-7):C30B29/18 主分类号 B65D85/38
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