发明名称 Apparatus and method for pressing two substrates together
摘要 The spaces in chuck grooves 3a and 3b are evacuated to chuck the entire surface of a wafer 1 to the chuck surface of a wafer support table 3 and curve the wafer 1. A wafer 2 is horizontally opposed to the wafer 1, and the center of the wafer 2 is pressed by a press pin 6a. The centers of the two wafers 1 and 2 are contacted, and the contact portion gradually spreads to the vicinity of the periphery of a central portion 3c and takes a substantially circular shape. After that, the chuck by the chuck grooves 3a is stopped. Consequently, the wafer 1 flattens, and the entire surfaces of the wafers 1 and 2 are contacted. <IMAGE>
申请公布号 EP0899778(A3) 申请公布日期 2001.03.21
申请号 EP19980306689 申请日期 1998.08.20
申请人 CANON KABUSHIKI KAISHA 发明人 TAKISAWA, TORU;YONEHARA, TAKAO;YAMAGATA, KENJI
分类号 H01L21/683;H01L21/00;H01L21/02;H01L21/20;H01L27/12 主分类号 H01L21/683
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