| 摘要 |
A method of manufacturing a liquid crystal display device which can easily planarize the surface of a substrate and obtain a high aperture ratio, is disclosed.According to the present invention, firstly a first metal layer is formed a transparent insulating substrate. The portion of the first metal layer is then anodized, to define a gate and to form a first oxide layer on the substrate at both sides of the gate. Next, a gate insulating layer is formed on the overall substrate and a channel layer is formed on the gate insulating layer over the gate. Ohmic layers are then formed on the gate insulating layer to be overlapped with both side of the channel layer and a second metal layer is formed on the overall substrate. Thereafter, the portion of the second metal layer is anodized, to define source and drain on the ohmic layers and to form a second oxide layer. An insulating layer is then formed on the overall substrate and etched to expose the portion of the source, thereby forming a contact hole. Thereafter, a pixel electrode is formed on the insulating layer to be in contact with the source through the contact hole. In this embodiment, the first metal layer is formed of an aluminum and the insulating layer formed of a SiNx layer. Furthermore, the channel layer is formed using a photoresist layer pattern formed by back-exposure using the gate as an exposure mask.
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