发明名称 |
LOW MELTING POINT GLASS FOR FORMATION OF TRANSPARENT INSULATING COATING FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a low melting point glass for the formation of a transparent insulating coating film which can be fired in a wide temperature range, which has good defoaming property and excellent transparency and see-through property and which can suppress corrosion in transparent electrode lines and bus electrode lines. SOLUTION: The low melting point glass is to be used for the formation of a transparent insulating coating film on a pattern of transparent electrode lines and bus electrode lines applied on a display panel substrate. The glass consists of a mixture of low melting glass powder (A) having 440 to 490 deg.C softening point and low melting glass power (B) having 510 to 580 deg.C softening point with the mixing ratio of the glass power (A) to glass powder (B) ranging from 40:60 to 70:30. The glass contains 1 to 4 wt.% oxides of the component of the transparent electrode and 0 to 0.7 wt.% oxides of the component of the bus electrode based on total 100 wt.% of the glass powder (A) and (B).
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申请公布号 |
JP2002029780(A) |
申请公布日期 |
2002.01.29 |
申请号 |
JP20000216461 |
申请日期 |
2000.07.17 |
申请人 |
CENTRAL GLASS CO LTD |
发明人 |
NISHIKAWA KAZUHIRO;HAYAKAWA NAOYA |
分类号 |
C03C8/22;H01J11/22;H01J11/34;H01J11/38;(IPC1-7):C03C8/22;H01J11/02 |
主分类号 |
C03C8/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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