发明名称 Backside contamination inspection device
摘要 A system for simultaneously inspecting the frontsides and backsides of semiconductor wafers for defects is disclosed. The system rotates the semiconductor wafer while the frontside and backside surfaces are generally simultaneously optically scanned for defects. Rotation is induced by providing contact between the beveled edges of the semiconductor wafer and roller bearings rotationally driven by a motor. The wafer is supported in a tilted or semi-upright orientation such that support is provided by gravity. This tilted supporting orientation permits both the frontside and the backside of the wafer to be viewed simultaneously by a frontside inspection device and a backside inspection device.
申请公布号 US6204917(B1) 申请公布日期 2001.03.20
申请号 US19990299698 申请日期 1999.04.26
申请人 KLA-TENCOR CORPORATION 发明人 SMEDT RODNEY G
分类号 G01N21/95;(IPC1-7):G01N21/00 主分类号 G01N21/95
代理机构 代理人
主权项
地址