| 摘要 |
PURPOSE:To eliminate necessity for providing any decompressed environment, construct the device small and movable, allow the device to operate with a high processing ability and at low cost, give less damage to the material to be processed, and subject the material to a surface processing locally as applicable. CONSTITUTION:A gas according to the purpose is introduced in a gas passage 2 formed from a dielectric material. A high frequency voltage is impressed, and within the gas passage the gas is allowed to conduct a gas discharge under the atmospheric pressure or with a certain pressure around it. The active seed of gas produced by this discharging is turned into a gas flow, to which a material to be processed 11 is exposed so that its surface undergoes the intended processing. |
