发明名称 |
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition for a lithographic printing plate which is high in sensitivity and superior in resistances to chemicals and printing. SOLUTION: This photosensitive composition comprises a monomer, having an ethylenically unsaturated bond and an acidic vinyl copolymer soluble or swellable in an aqueous solution of alkali and having unsaturated groups on its side chains and a photopolymerization initiator containing a titanocene compound and a halomethyloxadiazole compound. |
申请公布号 |
JP2001066773(A) |
申请公布日期 |
2001.03.16 |
申请号 |
JP19990240889 |
申请日期 |
1999.08.27 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
TSUJI SHIGEO |
分类号 |
G03F7/029;C08F2/50;G03F7/00;G03F7/027;G03F7/033;G03F7/038 |
主分类号 |
G03F7/029 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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