发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition for a lithographic printing plate which is high in sensitivity and superior in resistances to chemicals and printing. SOLUTION: This photosensitive composition comprises a monomer, having an ethylenically unsaturated bond and an acidic vinyl copolymer soluble or swellable in an aqueous solution of alkali and having unsaturated groups on its side chains and a photopolymerization initiator containing a titanocene compound and a halomethyloxadiazole compound.
申请公布号 JP2001066773(A) 申请公布日期 2001.03.16
申请号 JP19990240889 申请日期 1999.08.27
申请人 MITSUBISHI CHEMICALS CORP 发明人 TSUJI SHIGEO
分类号 G03F7/029;C08F2/50;G03F7/00;G03F7/027;G03F7/033;G03F7/038 主分类号 G03F7/029
代理机构 代理人
主权项
地址