SEMICONDUCTOR INTEGRATED CIRCUIT AND METHOD FOR DESIGNING THE SEMICONDUCTOR INTEGRATED CIRCUIT

摘要

PROBLEM TO BE SOLVED: To obtain a semiconductor integrated circuit which facilitates correcting operation for a mask and makes it efficient to vary the driving capacity of a transistor, without altering the arrangement position of a layout pattern, when a timing violation place, etc., is found after the mask layout of the semiconductor integrated circuit is formed and a method for designing the semiconductor integrated circuit. SOLUTION: This semiconductor integrated circuit is composed of a cell or function block constituted which includes a mask pattern 102 for gate electrode formation and a mask pattern 103 for active region formation on a semiconductor substrate. The semiconductor integrated circuit is characterized by that the length of a projection part of a gate electrode is made large in advance, and the output of the transistor can be controlled with the right-left width of the mask pattern 103 for the mask pattern 103 for active region formation.